What is sapphire crystal rod and its application

Sapphire crystal rods are aluminum oxide crystals used to produce sapphire substrate

The application of sapphire crystal rod is the application of sapphire.As long as we know its performance, we know where it applies.

Sapphire is hexagonal lattice structure, and many properties are determined by its crystal direction.By epitaxial crystal film growth, different crystal orientation will present different lattices to match the target material.-- Sapphire substrate has certain birefringent characteristics, and special crystal axis is used in some optical fields, such as polarized substrate: -- C-section sapphire substrate is used to grow III-V and II-VI sedimentary films, such as gallium nitride, which can produce blue LED products, laser diodes and infrared detector applications.The A-type substrate produces A uniform permittivity/medium and is highly insulated for use in hybrid microelectronics.High temperature superconductors can be produced from a-type substrate long crystals.-- Silicon extrinsic elongate crystals of different deposition grown on R-type substrates, used in microelectronic integrated circuits.Sapphire is the best choice for mixed substrates due to its high permittivity, for example in microwave integrated circuits.In addition, high speed integrated circuit and pressure sensor can be formed during the process of epitaxial silicon film growing.R-type base growth can also be used in the fabrication of leads, other superconducting components, high resistance resistors and gallium arsenide.-- The M, A and R types can all grow non-polar or semi-polar gallium nitride.Sapphire as a commercial product still needs a lot of research to improve the material quality of gallium nitride.Purity: -- Sapphire is an insulating material whose semiconductor properties are altered by doping and impurity.Therefore, most of the purity control is not due to the strict control of the substrate materials (silicon, gallium arsenide, indium phosphide...)., but by a small amount of doped material to change its optical properties (color, optical conductivity range), which is critical for certain applications (optical, military).-- Sapphire is also of critical importance in SoS applications as its purity has a strong effect on electrical properties and metal surface cross-contamination in CMOS applications.Sapphire purity has not been proven to have an impact on LED applications, and SoS manufacturers attribute its characteristics to sapphire substrate.Guide mode method (fixed edge film feeding method) :Heating/melt - - - - in the seed crystal/crystal pulling - - - - - 2 meters long and 100 mm wide ribbon or 9 * 26, 12 * 20 feet of the huge sapphire plate - more than 65 feet long, tubular sapphire or other shapes, sapphire crystal by different base (A, R, C, other) stretch for different crystallographic orientation arrangement, mainly used in industry and machinery manufacturing industry - in inert gas (nitrogen, argon gas) in the growth rate of 1 ~ 5 cm/h, the start of the long crystal of different crystal can also (sometimes can be more than 20)